Nickel Oxide Standard for Analytical Electron Microscopy

Nickel Oxide thin films for X-ray analysis and EELS calibration are available with thicknesses ranging from 25 to 65nm, and with substrates such as carbon thin film on Molybdenum TEM grids and holey silicon nitride with single-layer graphene.

Example HR-TEM image of 65nm NiOx thin film on Molybdenum-carbon TEM grid.