Microporous Silicon Nitride Membranes
January 19, 2016Typical Specifications
Low-Stress 200nm silicon nitride membrane for added resilience
0.5mmx0.5mm up to 1.0×1.0mm aperture
5.0, 2.50, 1.25 and 1.0 micrometer circular holes
Close packed hexagonal arrangement for high-density of holes
450×450 micrometer array
Fabricated using photolithography
![](http://aisthesis-products.com/wp-content/uploads/2016/01/2.5-Micron-Holes-in-200nm-SiN-membrane-May-2008_Page_3_Image_0001.jpg)