Nanoporous Silicon Nitride Membranes

Typical Specifications

  • Low-Stress 200nm silicon nitride membrane for added resilience
  • 0.5mmx0.5mm up to 1.0×1.0mm aperture
  • 750, 500, 400, 300, 200, 150 and 100nm circular holes
  • Close-packed hexagonal arrangement for high density of holes
  • 450×450 micrometer array
  • Fabricated using photo or e-beam lithography
400 nm Porous Membrane Image
Example 400nm Porous Membrane Image