Nanoporous Silicon Nitride Membranes

Typical Specifications

• Low-Stress 200nm silicon nitride membrane for added resilience
• 0.5mmx0.5mm up to 1.0×1.0mm aperture
• 750, 500, 400, 300, 200, 150 and 100nm circular holes
• Close-packed hexagonal arrangement for high density of holes
• 450×450 micrometer array
• Fabricated using photo or e-beam lithography