Surface Modified Silicon Nitride Membranes

Atomic Layer-Deposited (ALD) Modified Silicon Nitride Membranes with Hydrophobic and Hydrophilic Properties for Nanotechnology and Biotechnology Applications


  • High and low surface energies
  • Smooth and conformal substrates
  • Enhanced wetting and biocompatibility (hydrophilic coating)
  • Removes the need for plasma treatment of surface prior to cell growth
  • Hydrophobic coating offers novel platform for deposition and growth of nanomaterials

Chemistry and Properties

  • Hydrophilic: 5nm atomic layer-deposited alumina on 15, 50 and 200nm ultra low stress silicon nitride membrane
  • Hydrophobic: 5nm atomic layer-deposited alumina and 1nm tridecafluoro-1,1,2,2-tetrahydro-octyl-methyl-bis(dimethylamino)silane on 15, 50 and 200nm low stress silicon nitride membrane

Alumina (Hydrophilic) ALD Process

Hydrophilic Surface (XPS)

Hydrophobic Surface (XPS)

AFM Surface Roughness

Data obtained over a 3×3 micrometer area using a Veeco Dimension 3100 Nanoman AFM