Surface Modified Silicon Nitride Membranes
December 12, 2016Atomic Layer-Deposited (ALD) Modified Silicon Nitride Membranes with Hydrophobic and Hydrophilic Properties for Nanotechnology and Biotechnology Applications
Advantages
- High and low surface energies
- Smooth and conformal substrates
- Enhanced wetting and biocompatibility (hydrophilic coating)
- Removes the need for plasma treatment of surface prior to cell growth
- Hydrophobic coating offers novel platform for deposition and growth of nanomaterials
Chemistry and Properties
- Hydrophilic: 5nm atomic layer-deposited alumina on 15, 50 and 200nm ultra low stress silicon nitride membrane
- Hydrophobic: 5nm atomic layer-deposited alumina and 1nm tridecafluoro-1,1,2,2-tetrahydro-octyl-methyl-bis(dimethylamino)silane on 15, 50 and 200nm low stress silicon nitride membrane
Alumina (Hydrophilic) ALD Process
Hydrophilic Surface (XPS)
Hydrophobic Surface (XPS)
AFM Surface Roughness
Data obtained over a 3×3 micrometer area using a Veeco Dimension 3100 Nanoman AFM